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2045 |
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Tuesday, May 04, 2010, Sophia Room 1:40 PM Young Scientists |
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A particle image velocimetry method for low illumination conditions based on continuous particle image velocimetry |
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Lars Rockstroh* / Stuttgart University /
Institute of Parallel and Distributed Systems, Germany Marek Wroblewski / Stuttgart University / Institute of Parallel and Distributed Systems, Germany Jürgen Hillebrand/ Stuttgart University / Institute of Parallel and Distributed Systems, Germany Ana Balevic/ Stuttgart University / Institute of Parallel and Distributed Systems, Germany Mohammed Zubair Shaikh/ Stuttgart University / Institute of Parallel and Distributed Systems, Germany Sven Simon/ Stuttgart University / Institute of Parallel and Distributed Systems, Germany Rainer Gadow/ Stuttgart University / Institute for Manufacturing Technologies of Ceramic Components and Composites, Germany |
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Continuous Particle Image Velocimetry (CPIV) is based on motion blurring of particles captured in one image. Motion blurring is caused by the exposure time of the imaging system and the velocity of the particles. This paper presents ?Continuous Correlation-based Particle Image Velocimetry? (CCPIV) which is an evolution of CPIV. CCPIV is capable of measuring molten and non-molten particles with low reflectivity using low intensity light sources for illumination. Signal strength is boosted by massive digital signal processing which requires a large amount of computational power. A processing unit based on parallel hardware acceleration is described that takes the computational power required by CCPIV into account. Simulations prove the functionality and reliability of CCPIV under a variety of conditions found in thermal spraying processes. CCPIV is analyzed and compared to established image-based particle velocimetry methods such as Particle Tracking Velocimetry, Particle Shape Imaging and Continuous Particle Image Velocimetry. Criteria for analysis and comparison are boundaries on accuracy of the measurements, complexity of the measuring setup, required computational power, cost of materials and applicability for rough industrial environments. |