Abstract No.:
2144

 Scheduled at:
Tuesday, May 04, 2010, Sophia Room 9:20 AM
Nanomaterial Coatings 1


 Title:
Crystal and micro structures of plasma sprayed yttrium oxide coatings by axial injection of fine powder slurries

 Authors:
Junya Kitamura* / Fujimi Incorporated, Japan
Hiroaki Mizuno/ Fujimi Incorporated, Japan
Kazuto Sato/ Fujimi Incorporated, Japan
Zhaolin Tang/ Northwest Mettech Corp., Canada
Alan Burgess/ Northwest Mettech Corp., Canada

 Abstract:
Yttrium oxide coatings have been prepared with high power axial injection plasma spraying using fine powder slurries. It is clarified that the coatings have high hardness, low porosity and high erosion resistance against CF4 contained plasma in the previous study. This suggests that the plasma spraying of yttrium oxide with slurry injection techniques is applicable to fabricating equipments for semiconductor devices, such as dry etching. Surface morphologies of the slurry coatings with splats are almost similar to conventional plasma-sprayed yttria coatings, identified from microstructural analysis by field emission SEM in this study. However, no lamellar structure has been seen from cross sectional analysis, which is apparently different from the conventional coatings. It has also been found that crystal structure of the slurry yttria coatings mainly composed of metastable phase of monoclinic structure, whereas the powders and the conventional coatings are generally stable phase of cubic structure. Mechanism of coating formation by plasma spraying with fine powder slurries will be discussed based on the findings.

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